Furnace Systems—Ultra FnA

Precise and uniform deposition of ultra-thin films

As logic nodes continue to shrink, atomic layer deposition (ALD) is critical for meeting advanced process requirements in IC and compound semiconductor manufacturing. Thermal ALD lets you deposit ultra-thin, nanometric films precisely and uniformly. It is an ideal deposition process for high aspect ratio 3D structures, such as FinFETs, CFETs and nanosheets. Additionally, thermal ALD supports a variety of film materials.

Our Ultra FnA ALD system delivers everything you look for in high-throughput batch ALD processing. It deposits both silicon nitride (SiN) and silicon carbide nitride (SiCN) with good step coverage and uniformity within wafer and wafer-to-wafer and is easily customized with minor component and layout changes. Its innovative design also combines our proven software technology with new hardware that improves durability and reliability, as well as our proprietary process-control IP to provide rapid, stable process control.

Major Benefits

Superior process control

Because of its inventive hardware design and proprietary algorithm, the Ultra FnA delivers superior temperature and pressure control, ensuring the stability of the reaction process that takes place inside the chamber.

Cost-effective

Through its proprietary algorithm for temperature and pressure control, the Ultra FnA ensures that today’s advanced devices with fine geometries are protected, improving throughput and yield to deliver a low cost of ownership.

Features & Specifications

• Batch processing of up to 100 wafers
• 300mm wafer compatibility
• Quick ramping control heater keeps the temperature within two limits from the bottom to the top of the heating unit, allowing for precise, consistent temperature control across the entire heating chamber
• Four loadports – two automated, two manual
• Loading area O2 concentration control
• IGS gas supply system
• In situ dry cleaning system
• SEMI standard
• Five-unit configuration:
  • Boat unit
  • Reactor unit
  • Gas supply unit
  • Vacuum unit
  • Wafer transfer unit