Track

Discover ACM’s Track System Capabilities

Are you ready to get better results from your i-line, KrF, and ArF lithography processes for your logic and memory devices? Then it’s time to consider a lithography track system. Lithograpy tracks allow you to streamline the coating and developing steps by performing them sequentially on one tool, resulting in increased throughput and improved yields at a low cost of ownership.

Lithography Has Never Been Better

Coater/developer track tools support the photolithography process. You’re looking for a system designed to deliver ideal conditions for the entire process and optimize the coating and developing steps before and after the wafer is exposed in a lithography tool.

At ACM, we’ve put the expertise of our cleaning, coating, and developing process tools into our track system. Our 300mm process tool delivers uniform air downflow, fast robot handling, and software customized to your needs.